Suppression of photo-bias instability of transparent amorphous indium oxide thin film transistors by in situ nitrogen doping

Chih Hsiang Chang; Po-Tsun Liu; Yun Chu Tsai

Suppression of photo-bias instability of transparent amorphous indium oxide thin film transistors by in situ nitrogen doping

Chih Hsiang Chang, Po-Tsun Liu, Yun Chu Tsai

Department of Photonics

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Abstract

In this study, we analyzed the In₂O₃ thin films with different nitrogen flow rate during sputtering as the transistor's channel layer. The electrical analysis including device's reliability and material analysis were both examined.

Original language	English
Title of host publication	22nd International Display Workshops, IDW 2015
Publisher	International Display Workshops
Pages	623-625
Number of pages	3
ISBN (Electronic)	9781510845503
State	Published - 2015
Event	22nd International Display Workshops, IDW 2015 - Otsu, Japan Duration: 9 Dec 2015 → 11 Dec 2015

Publication series

Name	Proceedings of the International Display Workshops
Volume	1
ISSN (Print)	1883-2490

Conference

Conference	22nd International Display Workshops, IDW 2015
Country/Territory	Japan
City	Otsu
Period	9/12/15 → 11/12/15

Keywords

Indium oxide
Nitrogen
Thin-film transistors

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

Cite this

@inproceedings{c9a13dfc8fb9447daff6f9ff6f375a84,

title = "Suppression of photo-bias instability of transparent amorphous indium oxide thin film transistors by in situ nitrogen doping",

abstract = "In this study, we analyzed the In2O3 thin films with different nitrogen flow rate during sputtering as the transistor's channel layer. The electrical analysis including device's reliability and material analysis were both examined.",

keywords = "Indium oxide, Nitrogen, Thin-film transistors",

author = "Chang, {Chih Hsiang} and Po-Tsun Liu and Tsai, {Yun Chu}",

note = "Publisher Copyright: {\textcopyright} 2015 Society for Information Display.; 22nd International Display Workshops, IDW 2015 ; Conference date: 09-12-2015 Through 11-12-2015",

year = "2015",

language = "English",

series = "Proceedings of the International Display Workshops",

publisher = "International Display Workshops",

pages = "623--625",

booktitle = "22nd International Display Workshops, IDW 2015",

}

Chang, CH, Liu, P-T & Tsai, YC 2015, Suppression of photo-bias instability of transparent amorphous indium oxide thin film transistors by in situ nitrogen doping. in 22nd International Display Workshops, IDW 2015. Proceedings of the International Display Workshops, vol. 1, International Display Workshops, pp. 623-625, 22nd International Display Workshops, IDW 2015, Otsu, Japan, 9/12/15.

Suppression of photo-bias instability of transparent amorphous indium oxide thin film transistors by in situ nitrogen doping. / Chang, Chih Hsiang; Liu, Po-Tsun; Tsai, Yun Chu.
22nd International Display Workshops, IDW 2015. International Display Workshops, 2015. p. 623-625 (Proceedings of the International Display Workshops; Vol. 1).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - Suppression of photo-bias instability of transparent amorphous indium oxide thin film transistors by in situ nitrogen doping

AU - Chang, Chih Hsiang

AU - Liu, Po-Tsun

AU - Tsai, Yun Chu

PY - 2015

Y1 - 2015

N2 - In this study, we analyzed the In2O3 thin films with different nitrogen flow rate during sputtering as the transistor's channel layer. The electrical analysis including device's reliability and material analysis were both examined.

AB - In this study, we analyzed the In2O3 thin films with different nitrogen flow rate during sputtering as the transistor's channel layer. The electrical analysis including device's reliability and material analysis were both examined.

KW - Indium oxide

KW - Nitrogen

KW - Thin-film transistors

UR - http://www.scopus.com/inward/record.url?scp=85056386516&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:85056386516

T3 - Proceedings of the International Display Workshops

SP - 623

EP - 625

BT - 22nd International Display Workshops, IDW 2015

PB - International Display Workshops

T2 - 22nd International Display Workshops, IDW 2015

Y2 - 9 December 2015 through 11 December 2015

ER -

Suppression of photo-bias instability of transparent amorphous indium oxide thin film transistors by in situ nitrogen doping

Abstract

Publication series

Conference

Keywords

UN SDGs

Other files and links

Fingerprint

Cite this