Suppression of p-type parasitic channel formation at the interface between the aluminum nitride nucleation layer and the high-resistivity silicon substrate

Pojung Lin, Jiazhe Liu, Hongche Lin, Zhiyuan Chuang, Wenching Hsu, Yiche Chen, Poliang Liu, Rayhua Horng*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

In this study, GaN-based epitaxial structures were grown on high-resistivity silicon (HRSi) substrates by metalorganic chemical vapor deposition. The p-type parasitic channels generated at the interfaces of the aluminum nitride (AlN) nucleation layers and HRSi substrates were characterized by surface capacity measurement, backside secondary ion mass spectrometry, and spread resistance profiling. The 2-nm thick silicon nitride (SiNx) layer formed by nitridation on the HRSi substrates was used to suppress the Al diffusion from the 50-nm AlN nucleation layer and also prevented from generation of the p-type parasitic channels. The p-type parasitic channels induced insertion losses at high frequencies. Transmission line measurement was used to determine the insertion losses. The insertion loss of the GaN-based epitaxial structure with the optimized 25-nm AlN nucleation layer on the 2-nm SiNx layer was -2.72 dB/mm. It was only 0.04 dB/mm higher than that of the annealed HRSi substrate (-2.68 dB/mm) at 10 GHz. Obviously, the diffusion of Al from the optimized 25-nm thick AlN nucleation layer into the HRSi substrate can be alleviated by the SiNx layer, thereby reduced insertion loss.

Original languageEnglish
Article number102590
JournalSurfaces and Interfaces
Volume36
DOIs
StatePublished - Feb 2023

Keywords

  • Diffusion
  • Metalorganic vapor phase epitaxy
  • Nucleation
  • Silicon nitride

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