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Suppression of interfacial reaction for HfO2 on silicon by pre-CF4 plasma treatment
Chao Sung Lai*, Woei Cherng Wu, Tien-Sheng Chao, Jian Hao Chen, Jer Chyi Wang, Li Lin Tay, Nelson Rowell
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
39
Scopus
citations