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Suppression of boron penetration by using inductive-coupling-nitrogen-plasma in stacked amorphous/polysilicon gate structure
Wen Luh Yang*, Chiou Jyi Lin, Tien-Sheng Chao, Don Gey Liu, Tan Fu Lei
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
1
Scopus
citations