Subnanometer scaling of HfO2/metal electrode gate stacks

Jeff J. Peterson*, Chadwin D. Young, Joel Barnett, Sundar Gopalan, Jim Gutt, Choong Ho Lee, Hong Jyh Li, Tuo-Hung Hou, Yudong Kim, Chan Lim, Nirmal Chaudhary, Naim Moumen, Byoung Hun Lee, Gennadi Bersuker, George A. Brown, Peter M. Zeitzoff, Mark I. Gardner, Robert W. Murto, Howard R. Huff

*Corresponding author for this work

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