Sub-nanometer high-k gate stack scaling using the HF-last/NH3 anneal interface

Jeff J. Peterson*, Joel Barnett, Chadwin D. Young, Tuo-Hung Hou, Jim Gutt, Sundar Gopalan, Choong Ho Lee, Hong Jyb Li, Naim Moumen, Nirmal Chaudhary, Byoung Hun Lee, Gennadi Bersuker, Peter M. Zeitzoff, George A. Brown, Pat Lysaght, Mark Gardner, Robert W. Murto, Howard R. Huff

*Corresponding author for this work

Research output: Contribution to conferencePaperpeer-review

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Engineering

Material Science