Study of thermal stability of HfOxNy/Ge capacitors using postdeposition annealing and NH3 plasma pretreatment

Chao Ching Cheng*, Chao-Hsin Chien, Guang Li Luo, Chun Hui Yang, Mei Ling Kuo, Je Hung Lin, Chih Kuo Tseng, Chun Yen Chang

*Corresponding author for this work

    Research output: Contribution to journal › Article › peer-review

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    Engineering

    Material Science

    Earth and Planetary Sciences