Study of crystallinity in μc-Si:H films deposited by cat-CVD for thin film solar cell applications

C. H. Hsu, Y. P. Hsu, F. H. Yao, Y. T. Huang, C. C. Tsai, Hsiao-Wen Zan, C. C. Bi, C. H. Lu, C. H. Yeh

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations


The crystallinity of the hydrogenated microcrystalline silicon (μc-Si:H) film was known to influence the solar cell efficiency greatly. Also hydrogen was found to play a critical role in controlling the crystallinity. Instead of employing conventional plasma deposition techniques, this work focused on using catalytic chemical vapor deposition (Cat-CVD) to study the effect of hydrogen dilution and the filament-to-substrate distance on the crystallinity, deposition rate, microstructure factor and electrical property of the μc-Si:H film. We found that the substrate material and structure can affect the crystallinity of the μc-Si:H film and the incubation effect. Comparing bare glass, TCO-coated glass, a-Si:H-coated glass and μc-Si:H-coated glass, the microcrystalline phase grows the fastest onto μc-Si:H surface, but the slowest onto a-Si:H surface. Surprisingly, the template effect lasted for more than a thousand atomic layers of silicon.

Original languageEnglish
Title of host publicationAmorphous and Polycrystalline Thin-Film Silicon Science and Technology - 2010
Number of pages6
StatePublished - 24 Dec 2010
Event2010 MRS Spring Meeting - San Francisco, CA, United States
Duration: 5 Apr 20109 Apr 2010

Publication series

NameMaterials Research Society Symposium Proceedings
ISSN (Print)0272-9172


Conference2010 MRS Spring Meeting
Country/TerritoryUnited States
CitySan Francisco, CA


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