Structure and thermal stability of MOCVD ZrO₂ films on Si (1 0 0)

X. Wu^*, D. Landheer, M. J. Graham, H. W. Chen, T. Y. Huang, Tien-Sheng Chao

^*Corresponding author for this work

Department of Electrophysics

Research output: Contribution to journal › Article › peer-review

28 Scopus citations

Engineering & Materials Science

Chemical Compounds

Physics & Astronomy