Strategic Realization of the Highest Possible Pixel Density for Quantum Dot Color Converter with Optimized Performance

Chih Jung Chen, Kuan An Chen, Wei Hung Kuo, Chun I. Wu, Jia Wun Shen, Hao Chung Kuo, Ray Kuang Chiang*

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

1 Scopus citations

Abstract

The light extraction efficiency of QDCC (quantum dot color converter) is low when its aspect ratio (width to thickness ratio) of a subpixel is less than two, which causes the problem in their high-resolution applications. Using QDPR (quantum dot photoresist) of high OD (optical density) values and PenTile subpixel arrangement, an apparent high-resolution application is feasible, in which the QDCC film thickness is less than 2 μm. Further incorporation of yellow color filter film or color purified layer (CPL) on the QDCC film can optimize its optical performance. Theoretically, QDCC with pixel density over 3000 ppi is achievable when it is directly applied to the CMOS substrate. In a trial test QDCC is applied on a glass substrate, which results in pixel density of 2116 ppi and color gamut of NTSC 109.64%.

Original languageEnglish
Pages (from-to)1725-1727
Number of pages3
JournalDigest of Technical Papers - SID International Symposium
Volume54
Issue number1
DOIs
StatePublished - 2023
EventSID International Symposium Digest of Technical Papers, 2023 - Los Angeles, United States
Duration: 21 May 202326 May 2023

Keywords

  • AR/VR
  • color conversion
  • micro LED
  • photoresist
  • Quantum dot

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