Statistical analysis of metal gate workfunction variability, process variation, and random dopant fluctuation in nano-CMOS circuits

Chih Hong Hwang*, Tien Yeh Li, Ming Hung Han, Kuo Fu Lee, Hui Wen Cheng, Yi-Ming Li

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

7 Scopus citations

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Engineering