Stability of Sputtered Amorphous Tungsten-doped Indium Oxide Based Thin-Film Transistors

Qun Zhang*, Zhao Yang, Mingyue Qu, Ruofan Fu, Po Tsun Liu*, Han Ping D. Shieh

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

2 Scopus citations

Abstract

The stability of sputtered amorphous tungsten-doped indium oxide based thin film transistors was investigated after illuminated under different wavelengths and annealed in different atmospheres. It reveals that the stability is dependent on the wavelength and illumination time, and can be improved after annealed in oxygen, nitrogen or at appropriate annealing temperature.

Original languageEnglish
Pages (from-to)225-227
Number of pages3
JournalDigest of Technical Papers - SID International Symposium
Volume49
Issue number1
DOIs
StatePublished - 2018
EventSID Symposium, Seminar, and Exhibition 2018, Display Week 2018 - Los Angeles, United States
Duration: 20 May 201825 May 2018

Keywords

  • sputtering
  • stability
  • thin film transistor
  • tungsten-doped indium oxide

Fingerprint

Dive into the research topics of 'Stability of Sputtered Amorphous Tungsten-doped Indium Oxide Based Thin-Film Transistors'. Together they form a unique fingerprint.

Cite this