Stability of Schottky Barrier Diode Integrated in p-GaN Enhancement-mode GaN Power Technology

Jethro Oroceo Gallardo, Brice De Jaeger, Sachidananda Dash, Shun Wei Tang, Thanh Nga Tran, Dirk Wellekens, Benoit Bakeroot, Stefaan Decoutere, Tian Li Wu

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

In this work, the performance and stability of integrated power Schottky Barrier Diodes (SBD) are reported. We demonstrate the fabrication method to integrate Gated Edge Termination (GET)-SBD into a p-GaN E-mode GaN power technology for 200V power switching applications. The 30mm wide integrated SBDs show a low forward voltage (Vf) and can deliver more than 10A and 6A at Vac=3V for 25°C and 150°C, respectively. Furthermore, an on-resistance (Ron) increase of less than 20% up to 200V at 25°C/150°C can be obtained during pulsed IV characterization and OFF-state stress, indicating a promising stability of the integrated GET-SBDs on power p-GaN Gate High Electron Mobility Transistors (HEMTs) platform.

Original languageEnglish
Title of host publication2021 IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA 2021
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages1-6
Number of pages6
ISBN (Electronic)9781665439886
DOIs
StatePublished - 2021
Event2021 IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA 2021 - Singapore, Singapore
Duration: 15 Sep 202115 Oct 2021

Publication series

NameProceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA
Volume2021-September

Conference

Conference2021 IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA 2021
Country/TerritorySingapore
CitySingapore
Period15/09/2115/10/21

Keywords

  • GaN
  • Monolithic Integration
  • Schottky Barrier Diode
  • p-GaN HEMTs

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