Spike anneal qualification for 0.13 μm USJ technology on Radiance™ Centura®

H. L. Sun*, H. M. Jao, H. T. Huang, J. Y. Pan, Tuo-Hung Hou, S. Chen, S. Ramamurthy, E. Chiao, D. Wilusz, A. Chen

*Corresponding author for this work

Research output: Contribution to conferencePaperpeer-review

1 Scopus citations

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Engineering & Materials Science