Abstract
We demonstrated the controlled placement of a Ge quantum dot (QD) along with tunnel-junction engineering in a self-organized approach for the effective management of single charge tunneling. In this approach, a single-Ge-QD ( ∼11 nm) self-aligning with nickel-polycide electrodes is realized by thermally oxidizing a SiGe nanorod that bridges a 15-nm-wide nanotrench in close proximity to electrodes via a spacer bilayer of Si3N 4/SiO2. The fabricated Ge-QD single-hole transistor exhibits clear Coulomb oscillation and Coulomb diamond behaviors at T = 77 K?150 K, providing a way to analyze the electronic structure of the Ge QD.
Original language | English |
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Article number | 6352881 |
Pages (from-to) | 3224-3230 |
Number of pages | 7 |
Journal | IEEE Transactions on Electron Devices |
Volume | 59 |
Issue number | 12 |
DOIs | |
State | Published - 4 Dec 2012 |
Keywords
- Ge
- quantum dot (QD) placementself-aligned electrode
- single electron