Silicon Wafers with Facet-Dependent Electrical Conductivity Properties

Chih Shan Tan, Pei Lun Hsieh, Lih Juann Chen*, Michael H. Huang

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

48 Scopus citations

Abstract

By breaking intrinsic Si (100) and (111) wafers to expose sharp {111} and {112} facets, electrical conductivity measurements on single and different silicon crystal faces were performed through contacts with two tungsten probes. While Si {100} and {110} faces are barely conductive at low applied voltages, as expected, the Si {112} surface is highly conductive and Si {111} surface also shows good conductivity. Asymmetrical I–V curves have been recorded for the {111}/{112}, {111}/{110}, and {112}/{110} facet combinations because of different degrees of conduction band bending at these crystal surfaces presenting different barrier heights to current flow. In particular, the {111}/{110} and {112}/{110} facet combinations give I–V curves resembling those of p–n junctions, suggesting a novel field effect transistor design is possible capitalizing on the pronounced facet-dependent electrical conductivity properties of silicon.

Original languageEnglish
Pages (from-to)15339-15343
Number of pages5
JournalAngewandte Chemie - International Edition
Volume56
Issue number48
DOIs
StatePublished - 27 Nov 2017

Keywords

  • band bending
  • electrical conductivity
  • facet-dependent properties
  • field-effect transistors
  • silicon

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