Shape-optimized electrooptic beam scanners: Analysis, design, and simulation

Yi Chiu; Jie Zou; Daniel D. Stancil; T. E. Schlesinger

doi:10.1109/50.737429

Shape-optimized electrooptic beam scanners: Analysis, design, and simulation

Yi Chiu
, Jie Zou
, Daniel D. Stancil
, T. E. Schlesinger

Department of Electrical and Computer Engineering

Research output: Contribution to journal › Article › peer-review

46 Scopus citations

Abstract

This paper presents the analysis of a general nonrectangular clectrooptic (EO) scanner and compare its performance to a rectangular device. Since the scanning sensitivity of an EO scanner is inversely proportional to its width, high sensitivity requires the device contour to be close to the ray trajectory of a beam propagating through the device. Accordingly, a shaped-optimized scanner is designed so that the beam trajectory at maximum deflection is parallel to the device contour. A beam propagation method (BPM) simulation shows the performance agrees well with the analysis.

Original language	English
Pages (from-to)	108-113
Number of pages	6
Journal	Journal of Lightwave Technology
Volume	17
Issue number	1
DOIs	https://doi.org/10.1109/50.737429
State	Published - 1 Dec 1999

Keywords

BPM simulation
Electrooptic (EO) scanner
Ray equation
Ray tracing
Scanning sensitivity

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10.1109/50.737429

Cite this

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title = "Shape-optimized electrooptic beam scanners: Analysis, design, and simulation",

abstract = "This paper presents the analysis of a general nonrectangular clectrooptic (EO) scanner and compare its performance to a rectangular device. Since the scanning sensitivity of an EO scanner is inversely proportional to its width, high sensitivity requires the device contour to be close to the ray trajectory of a beam propagating through the device. Accordingly, a shaped-optimized scanner is designed so that the beam trajectory at maximum deflection is parallel to the device contour. A beam propagation method (BPM) simulation shows the performance agrees well with the analysis.",

keywords = "BPM simulation, Electrooptic (EO) scanner, Ray equation, Ray tracing, Scanning sensitivity",

author = "Yi Chiu and Jie Zou and Stancil, \{Daniel D.\} and Schlesinger, \{T. E.\}",

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T2 - Analysis, design, and simulation

AU - Chiu, Yi

AU - Zou, Jie

AU - Stancil, Daniel D.

AU - Schlesinger, T. E.

PY - 1999/12/1

Y1 - 1999/12/1

N2 - This paper presents the analysis of a general nonrectangular clectrooptic (EO) scanner and compare its performance to a rectangular device. Since the scanning sensitivity of an EO scanner is inversely proportional to its width, high sensitivity requires the device contour to be close to the ray trajectory of a beam propagating through the device. Accordingly, a shaped-optimized scanner is designed so that the beam trajectory at maximum deflection is parallel to the device contour. A beam propagation method (BPM) simulation shows the performance agrees well with the analysis.

AB - This paper presents the analysis of a general nonrectangular clectrooptic (EO) scanner and compare its performance to a rectangular device. Since the scanning sensitivity of an EO scanner is inversely proportional to its width, high sensitivity requires the device contour to be close to the ray trajectory of a beam propagating through the device. Accordingly, a shaped-optimized scanner is designed so that the beam trajectory at maximum deflection is parallel to the device contour. A beam propagation method (BPM) simulation shows the performance agrees well with the analysis.

KW - BPM simulation

KW - Electrooptic (EO) scanner

KW - Ray equation

KW - Ray tracing

KW - Scanning sensitivity

UR - https://www.scopus.com/pages/publications/0032761262

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DO - 10.1109/50.737429

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SP - 108

EP - 113

JO - Journal of Lightwave Technology

JF - Journal of Lightwave Technology

IS - 1

ER -

Shape-optimized electrooptic beam scanners: Analysis, design, and simulation

Abstract

Keywords

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