SEM-Latch: A Lost-Cost and High-Performance Latch Design for Mitigating Soft Errors in Nanoscale CMOS Process

Zhong Li Tang, Chia Wei Liang, Ming Hsien Hsiao, Charles H.P. Wen

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Soft errors (primarily single-event transients (SET) and single-event upsets (SEU)) are receiving increased attention due to the increasing prevalence of automotive and biomedical electronics. In recent years, several latch designs have been developed for SEU/SET protection, but each has its own issues regarding timing, area, and power. Therefore, we propose a novel soft-error mitigating latch design, called SEM-Latch, which extends QUATRO and incorporates a speed path whereas embedding a reference voltage generator (RVG) for simultaneously improving timing, area, and power in 45nm CMOS process. SEM-Latch effectively reduces the power, area, and PDAP (product of delay, area, and power) by an average of 1.4%, 12.5%, and 8.7%, respectively, in comparison to a previous latch (HPST) with equivalent SEU protection. Furthermore, in comparison to AMSER-Latch, SEM-Latch reduces area, timing overhead and PDAP by 27.2%, 48.2%, and 60.2%, respectively, to provide 99.9999% particle rejection rate for SET protection.

Original languageEnglish
Title of host publicationProceedings of the 59th ACM/IEEE Design Automation Conference, DAC 2022
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages865-870
Number of pages6
ISBN (Electronic)9781450391429
DOIs
StatePublished - 10 Jul 2022
Event59th ACM/IEEE Design Automation Conference, DAC 2022 - San Francisco, United States
Duration: 10 Jul 202214 Jul 2022

Publication series

NameProceedings - Design Automation Conference
ISSN (Print)0738-100X

Conference

Conference59th ACM/IEEE Design Automation Conference, DAC 2022
Country/TerritoryUnited States
CitySan Francisco
Period10/07/2214/07/22

Fingerprint

Dive into the research topics of 'SEM-Latch: A Lost-Cost and High-Performance Latch Design for Mitigating Soft Errors in Nanoscale CMOS Process'. Together they form a unique fingerprint.

Cite this