Abstract
For high-voltage output driver, the lateral DMOS (LDMOS) is often used for both output function operation and self-protection against electrostatic discharge (ESD) events. In this work, a new structure of LDMOS output device with embedded SCR has been proposed and verified in a 0.25-μm 60-V BCD process. This new structure, with additional p+ and n+ implantation regions added between the drain contact and poly-gate of LDMOS, can keep it stably in the high-current holding region after snapback. By using this structure, the LDMOS can provide high enough self-protected ESD robustness for applications in the high-voltage output drivers.
Original language | English |
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Pages | 116-119 |
Number of pages | 4 |
DOIs | |
State | Published - 27 May 2013 |
Event | 2013 IEEE International Symposium on Next-Generation Electronics, ISNE 2013 - Kaohsiung, Taiwan Duration: 25 Feb 2013 → 26 Feb 2013 |
Conference
Conference | 2013 IEEE International Symposium on Next-Generation Electronics, ISNE 2013 |
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Country/Territory | Taiwan |
City | Kaohsiung |
Period | 25/02/13 → 26/02/13 |
Keywords
- Electrostatic discharges (ESD)
- lateral diffused MOS (LDMOS)
- silicon-controlled rectifier (SCR)