Abstract
a-Si:H TFTs on colorless polyimide substrates were successfully fabricated at low process temperature as 160 °C. The gate leakage current is as low as 10-13 A while the field-effect mobility is 0.42 cm2 V -1s-1 and subthreshold swing is 0.77 V/dec. By using bias-temperature stress, the influence of drain-bias modulated carrier concentration and self-heating on device reliability were investigated.
Original language | English |
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State | Published - 2009 |
Event | 2009 International Display Manufacturing Conference, 3D Systems and Applications, and Asia Display, IDMC/3DSA/Asia Display 2009 - Taipei, Taiwan Duration: 27 Apr 2009 → 30 Apr 2009 |
Conference
Conference | 2009 International Display Manufacturing Conference, 3D Systems and Applications, and Asia Display, IDMC/3DSA/Asia Display 2009 |
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Country/Territory | Taiwan |
City | Taipei |
Period | 27/04/09 → 30/04/09 |
Keywords
- A-Si: H TFT
- Flexible
- Reliability
- Self-heating