Self-assembled Si/SiO2 superlattice in Si-rich oxide films

Chu Yun Hsiao, Chuan Feng Shih*, Kuan Wei Su, Hui Ju Chen, Sheng Wen Fu

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

8 Scopus citations


This work involves as-prepared SiOx (x 2) films that were deposited by reactive sputtering. The regular Si/SiO2 superlattices were self-assembled without post-annealing. The periodicity of Si/SiO 2 superlattices was modulated by varying the oxygen flow rate and was associated with x in SiOx in the range 2-1.3. Si/SiO2 superlattices were formed under compressive stress and the factors that governed the periodicity were discussed.

Original languageEnglish
Article number053115
JournalApplied Physics Letters
Issue number5
StatePublished - 1 Aug 2011


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