Selected topics on HfO 2 gate dielectrics for future ULSI CMOS devices

  • M. F. Li*
  • , H. Y. Yu
  • , Y. T. Hou
  • , J. F. Kang
  • , X. P. Wang
  • , C. Shen
  • , C. Ren
  • , Y. C. Yeo
  • , C. X. Zhu
  • , D. S.H. Chan
  • , Albert Chin
  • , D. L. Kwong
    • *Corresponding author for this work

    Research output: Contribution to conference › Paper › peer-review

    6 Scopus citations

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    Material Science

    Immunology and Microbiology