Schottky-barrier S/D MOSFETs with high-K gate dielectrics and metal-gate electrode

Shiyang Zhu*, H. Y. Yu, S. J. Whang, J. H. Chen, Chen Shen, Chunxiang Zhu, S. J. Lee, M. F. Li, D. S.H. Chan, W. J. Yoo, Anyan Du, C. H. Tung, Jagar Singh, Albert Chin, D. L. Kwong

*Corresponding author for this work

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Engineering & Materials Science

Chemical Compounds