TY - JOUR
T1 - Roughness-induced strong pinning for drops evaporating from polymeric surfaces
AU - Lin, Tzyy Shyang
AU - Zeng, Yi Hong
AU - Tsay, Ruey Yug
AU - Lin, Shi Yow
N1 - Publisher Copyright:
© 2016 Taiwan Institute of Chemical Engineers.
PY - 2016/5/1
Y1 - 2016/5/1
N2 - The dynamic behavior of water drops evaporating from poly(methyl methacrylate) (PMMA) substrates with different roughness was examined. The relaxation of the wetting diameter, height, volume and the contact angle of a drop was monitored during the evaporation process. For the smoother substrates with Rq ≤ 19 nm, four stages were identified during evaporation: the initial spreading stage, the constant contact radius (CCR) stage, the constant contact angle (CCA) stage, and the final stage. In contrast, for substrates with large roughness (Rq ≥ 209 nm), the CCA stage was not observed, and the contact line was pinned at its original position during almost the entire lifetime of the drop. The energy barrier associated with the pinning and depinning of the contact line was estimated using the Shanahan model, and the energy associated with PMMA substrates of roughnessRq=4.9and 19 nm was found to be on the order of10-8J/m. The influences of the liquid withdrawal rate and the internal flow field were also studied, and the weak to strong pinning transition was found to be roughness dominant.
AB - The dynamic behavior of water drops evaporating from poly(methyl methacrylate) (PMMA) substrates with different roughness was examined. The relaxation of the wetting diameter, height, volume and the contact angle of a drop was monitored during the evaporation process. For the smoother substrates with Rq ≤ 19 nm, four stages were identified during evaporation: the initial spreading stage, the constant contact radius (CCR) stage, the constant contact angle (CCA) stage, and the final stage. In contrast, for substrates with large roughness (Rq ≥ 209 nm), the CCA stage was not observed, and the contact line was pinned at its original position during almost the entire lifetime of the drop. The energy barrier associated with the pinning and depinning of the contact line was estimated using the Shanahan model, and the energy associated with PMMA substrates of roughnessRq=4.9and 19 nm was found to be on the order of10-8J/m. The influences of the liquid withdrawal rate and the internal flow field were also studied, and the weak to strong pinning transition was found to be roughness dominant.
KW - Constant contact radius
KW - Evaporation
KW - Pinning and depinning
KW - Receding contact angle
KW - Roughness
KW - Triple line
UR - http://www.scopus.com/inward/record.url?scp=84975722524&partnerID=8YFLogxK
U2 - 10.1016/j.jtice.2016.02.015
DO - 10.1016/j.jtice.2016.02.015
M3 - Article
AN - SCOPUS:84975722524
SN - 1876-1070
VL - 62
SP - 54
EP - 59
JO - Journal of the Taiwan Institute of Chemical Engineers
JF - Journal of the Taiwan Institute of Chemical Engineers
ER -