Abstract
The room-temperature oxidation of Ni, Pd, and Pt silicides has been studied using electron spectroscopy for chemical analysis. It has been found that (1) Si atoms oxidize predominantly, (2) the oxidation of Si is enhanced in the metal-rich silicides, and (3) the growth of the surface oxide layer leaves behind a phase enriched with metal.
Original language | English |
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Pages (from-to) | 2253-2257 |
Number of pages | 5 |
Journal | Journal of Applied Physics |
Volume | 57 |
Issue number | 6 |
DOIs | |
State | Published - 1 Dec 1985 |