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Room-temperature and high-quality HfO2/SiO2gate stacked film grown by neutral beam enhanced atomic layer deposition
Beibei Ge, Daisuke Ohori, Yi Ho Chen, Takuya Ozaki, Kazuhiko Endo, Yi-Ming Li, Jenn-Hwan Tarng, Seiji Samukawa*
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
8
Scopus
citations