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Room-temperature and high-quality HfO2/SiO2gate stacked film grown by neutral beam enhanced atomic layer deposition

  • Beibei Ge
  • , Daisuke Ohori
  • , Yi Ho Chen
  • , Takuya Ozaki
  • , Kazuhiko Endo
  • , Yi-Ming Li
  • , Jenn-Hwan Tarng
  • , Seiji Samukawa*
    • *Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

9 Scopus citations

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Material Science