Skip to main navigation Skip to search Skip to main content

Rigorous electromagnetic simulation of mask magnification effects on the diffracted light for EUV binary mask

  • Chun Hung Lin*
  • , Hsuen Li Chen
  • , Fu-Hsiang Ko
    • *Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

3 Scopus citations

Fingerprint

Dive into the research topics of 'Rigorous electromagnetic simulation of mask magnification effects on the diffracted light for EUV binary mask'. Together they form a unique fingerprint.
Sort by

Keyphrases

Engineering

Material Science