TY - GEN
T1 - Reusable Detector of ZnO-based Transistor in Floating Gate Structure for High Sensitivity pH Sensor
AU - Chen, Yen Shuo
AU - You, Hsin Chiang
AU - Lin, Ching Chang
AU - Ko, Fu Hsiang
N1 - Publisher Copyright:
© 2023 IEEE.
PY - 2023
Y1 - 2023
N2 - In this paper, we propose a simple, low-temperature sol-gel preparation method for depositing thin-film transistors with zinc oxide (ZnO) semiconductor channel layer under oxygen treatment. A plasma method at a low power of 18 W is used to surface treatments. A novel floating-gate (FG) thin-film transistor structure is developed for detecting acid and alkaline standard buffer solutions. The hydrogen ions and hydroxide ions in the buffer are varied, resulting in a slight bias, and this indirectly affected the dielectric layer of the sensor. The device displays excellent pH sensitivity with an average voltage sensitivity of 562.5 mv/pH at pH values from 2 to 10, with optimal pH stability. This results in changes in the output of the electrical curve, which enables pH detection, which can be considered an excellent pH sensor.
AB - In this paper, we propose a simple, low-temperature sol-gel preparation method for depositing thin-film transistors with zinc oxide (ZnO) semiconductor channel layer under oxygen treatment. A plasma method at a low power of 18 W is used to surface treatments. A novel floating-gate (FG) thin-film transistor structure is developed for detecting acid and alkaline standard buffer solutions. The hydrogen ions and hydroxide ions in the buffer are varied, resulting in a slight bias, and this indirectly affected the dielectric layer of the sensor. The device displays excellent pH sensitivity with an average voltage sensitivity of 562.5 mv/pH at pH values from 2 to 10, with optimal pH stability. This results in changes in the output of the electrical curve, which enables pH detection, which can be considered an excellent pH sensor.
UR - http://www.scopus.com/inward/record.url?scp=85182028975&partnerID=8YFLogxK
U2 - 10.1109/NMDC57951.2023.10344188
DO - 10.1109/NMDC57951.2023.10344188
M3 - Conference contribution
AN - SCOPUS:85182028975
T3 - 2023 IEEE Nanotechnology Materials and Devices Conference, NMDC 2023
SP - 664
EP - 667
BT - 2023 IEEE Nanotechnology Materials and Devices Conference, NMDC 2023
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - 18th IEEE Nanotechnology Materials and Devices Conference, NMDC 2023
Y2 - 22 October 2023 through 25 October 2023
ER -