Reproducible formation of nanoscale-gap electrodes for single-molecule measurements by combination of FIB deposition and tunneling current detection

K. Shigeto*, M. Kawamura, A. Yu. Kasumov, K. Tsukagoshi, K. Kono, Y. Aoyagi

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

16 Scopus citations

Abstract

We have reproducibly fabricated suspended tungsten electrodes with a gap of less than 2 ran on a suspended silicon nitride membrane with a slit. Our fabrication technique is based on the local deposition of tungsten by a focused ion beam. The length of the nanogap between the electrodes was controlled by detecting a tunneling current during the growth of the tungsten electrodes from both sides of the slit. The gap length can reach about 1 nm, which corresponds to the size of a single molecule such as a fullerene. (c) 2006 Elsevier B.V. All rights reserved.

Original languageEnglish
Pages (from-to)1471-1473
Number of pages3
JournalMicroelectronic Engineering
Volume83
Issue number4-9
DOIs
StatePublished - Sep 2006
Event31st International Conference on Micro- and Nano-Engineering - Vienna, Austria
Duration: 19 Sep 200522 Sep 2005

Keywords

  • nanoelectrode
  • focused ion beam
  • single molecule
  • tunneling current

Fingerprint

Dive into the research topics of 'Reproducible formation of nanoscale-gap electrodes for single-molecule measurements by combination of FIB deposition and tunneling current detection'. Together they form a unique fingerprint.

Cite this