Reliability study of high-κ La2O3/HfO2 and HfO2/La2O3 stacking layers on n-In0.53Ga0.47As metal-oxide-semiconductor capacitor

Chung Ming Chu, Yueh Chin Lin, Wei-I Lee, Chang Fu Dee, Yuen Yee Wong, Burhanuddin Yeop Majlis, Muhamad Mat Salleh, Seong Ling Yap, Edward Yi Chang

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