Reliability of strained-channel NMOSFETs with SiN capping layer on Hi-wafers with a thin LPCVD-TEOS buffer layer

Tzu I. Tsai, Yao Jen Lee, King Sheng Chen, Jeff Wang, Chia Chen Wan, Fu Kuo Hsueh, Horng-Chih Lin, Tien-Sheng Chao, Tiao Yuan Huang

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

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