Reliability of strained-channel NMOSFETs with SiN capping layer on Hi-wafers with a thin LPCVD-TEOS buffer layer
- Tzu I. Tsai
- , Yao Jen Lee
- , King Sheng Chen
- , Jeff Wang
- , Chia Chen Wan
- , Fu Kuo Hsueh
- , Horng-Chih Lin
- , Tien-Sheng Chao
- , Tiao Yuan Huang
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review