Reliability of Multiple-Layer Stacked Gate-All-Around Poly-Si Nanosheet Channel Ferroelectric HfxZr1-xO2FETs With NH3Plasma Treatment

Dong Ru Hsieh, Chia Chin Lee, Tzu Chieh Hong, Wei Ju Yeh, Tien Sheng Chao*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

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Engineering & Materials Science

Chemical Compounds