Relative stabilities of tetramethyl orthosilicate and tetraethyl orthosilicate in the gas phase

Jason C.S. Chu; James Breslin; Niann-Shiah Wang; Ming-Chang Lin

doi:10.1016/0167-577X(91)90170-B

Relative stabilities of tetramethyl orthosilicate and tetraethyl orthosilicate in the gas phase

Jason C.S. Chu, James Breslin, Niann-Shiah Wang, Ming-Chang Lin^*

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

33 Scopus citations

Abstract

The stabilities of Si(OCH₃)₄ and Si(OC₂H₅)₄ have been studied pyrolytically using highly diluted mixtures near atmospheric-pressure conditions. FTIR spectrometric analyses of the disappearance of the reactants and the formation of various major stable products allow us to qualitatively account for the global difference in the measured overall first-order decay constants: TMOS is significantly more stable than TEOS. The mechanistic implication of these results is discussed.

Original language	English
Pages (from-to)	179-184
Number of pages	6
Journal	Materials Letters
Volume	12
Issue number	3
DOIs	https://doi.org/10.1016/0167-577X(91)90170-B
State	Published - Oct 1991

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title = "Relative stabilities of tetramethyl orthosilicate and tetraethyl orthosilicate in the gas phase",

abstract = "The stabilities of Si(OCH3)4 and Si(OC2H5)4 have been studied pyrolytically using highly diluted mixtures near atmospheric-pressure conditions. FTIR spectrometric analyses of the disappearance of the reactants and the formation of various major stable products allow us to qualitatively account for the global difference in the measured overall first-order decay constants: TMOS is significantly more stable than TEOS. The mechanistic implication of these results is discussed.",

author = "Chu, {Jason C.S.} and James Breslin and Niann-Shiah Wang and Ming-Chang Lin",

year = "1991",

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T1 - Relative stabilities of tetramethyl orthosilicate and tetraethyl orthosilicate in the gas phase

AU - Chu, Jason C.S.

AU - Breslin, James

AU - Wang, Niann-Shiah

AU - Lin, Ming-Chang

PY - 1991/10

Y1 - 1991/10

N2 - The stabilities of Si(OCH3)4 and Si(OC2H5)4 have been studied pyrolytically using highly diluted mixtures near atmospheric-pressure conditions. FTIR spectrometric analyses of the disappearance of the reactants and the formation of various major stable products allow us to qualitatively account for the global difference in the measured overall first-order decay constants: TMOS is significantly more stable than TEOS. The mechanistic implication of these results is discussed.

AB - The stabilities of Si(OCH3)4 and Si(OC2H5)4 have been studied pyrolytically using highly diluted mixtures near atmospheric-pressure conditions. FTIR spectrometric analyses of the disappearance of the reactants and the formation of various major stable products allow us to qualitatively account for the global difference in the measured overall first-order decay constants: TMOS is significantly more stable than TEOS. The mechanistic implication of these results is discussed.

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U2 - 10.1016/0167-577X(91)90170-B

DO - 10.1016/0167-577X(91)90170-B

M3 - Article

AN - SCOPUS:0026241859

SN - 0167-577X

VL - 12

SP - 179

EP - 184

JO - Materials Letters

JF - Materials Letters

IS - 3

ER -

Relative stabilities of tetramethyl orthosilicate and tetraethyl orthosilicate in the gas phase

Abstract

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