Reduction of etching plasma damage on low dielectric constant fluorinated amorphous carbon films by multiple H2 plasma treatment

Jia Min Shieh*, Kou Chiang Tsai, Bau Tong Dai, Yew-Chuhg Wu, Yu Hen Wu

*Corresponding author for this work

Research output: Contribution to journal › Conference article › peer-review

11 Scopus citations

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