Quantitative analysis of SILCs (stress induced leakage currents) based on the inelastic trap-assisted tunneling model

Shiro Kamohara*, Yutaka Okuyama, Yukiko Manabe, Kosuke Okuyama, Katsuhiko Kubota, Donggun Park, Chen-Ming Hu

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

4 Scopus citations

Abstract

We have successfully developed a new quantitative analytical ITAT (inelastic trap-assisted tunneling)-based SILC (stress induced leakage current) model which can explain both of the two field dependencies, i.e. Fowler-Nordheim (FN)-field and the direct tunneling (DT)-field dependence of A-mode and B-mode SILCs. White DT-field dependence of A-mode comes from the single trap assisted tunneling, FN-field dependence of B-mode originates at the tunneling via the multi-trap leakage path. We have also developed an analytical model for the anomalous SILC of the flash memory cell and investigate the properties of retention lifetime of failure bits. The anomalous SILC shows the DT-field dependence because of the tunneling via the incomplete multi-trap path. A remarkable behavior of retention characteristics predicted by our models is a nearly logarithmic time dependence. The Fowler-Nordheim tunneling model leads to an overestimation of lifetime at low Vth region. To take into account a position of each trap and clarify the detail characteristics of SILC, we have proposed a new Monte Carlo like approach for hopping conduction and successfully explained the anomalous SILC using only physical based parameters.

Original languageEnglish
Pages (from-to)206-214
Number of pages9
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume3881
DOIs
StatePublished - 1 Dec 1999
EventProceedings of the 1999 Microelectronic Device Technology III - Santa Clara, CA, USA
Duration: 22 Sep 199923 Sep 1999

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