Probing Electronic Structures of Ge Quantum Dot/SiN Barriers in Few-Hole Regime Using Drain Bias-Dependent Tunneling Current Spectroscopy

Chi Cheng Lai, Ting Tsai, David M.T. Kuo, Horng Chih Lin, Pei Wen Li*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

1 Scopus citations

Abstract

We reported energy-level distribution of Ge quantum-dot (QD)/Si3N4 barrier system using drain bias-dependent tunneling-current spectroscopy of single-hole transistors (SHTs). The studied SHT comprises a spherical Ge QD, self-organized tunneling barriers of Si3N4, and self-aligned p+-Si source/drain. Thanks to strong confinement, tunneling-current spectra features Coulomb blockade peaks with peak-to-valley ratios of 10-100 over a wide range of hole number. Addition energy has a large maximum for N+2, N+4, N+7 and N+10 as a result of 3D symmetrical potential barrier around the Ge QD. Extracted energy-level spacing and intra-level charging energies of 25-40 meV are large and conducive for improving charge sensitivity.

Original languageEnglish
Pages (from-to)2017-2020
Number of pages4
JournalIeee Electron Device Letters
Volume45
Issue number10
DOIs
StatePublished - 2024

Keywords

  • Germanium
  • QD
  • single-hole transistor

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