Preventing dielectric damage of low-k organic siloxane by passivation treatment

T. C. Chang*, Y. S. Mor, Po-Tsun Liu, T. M. Tsai, C. W. Chen, Y. J. Mei, Fu-Ming Pan, W. F. Wu, S. M. Sze

*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

10 Scopus citations

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Material Science