TY - GEN
T1 - Preparation of nano-scale patterns on the silicon oxide surface by dip-pen nanolithography
AU - Sheu, Jeng-Tzong
AU - Wu, C. H.
AU - Liu, H. H.
AU - Chao, Tien-Sheng
PY - 2005/12/1
Y1 - 2005/12/1
N2 - Dip-pen nanolithography (DPN), which uses an "inked" AFM tip to deposit organic molecules through a water meniscus onto an underlying substrate under ambient conditions, has been used to create N-(2-aminoethyl)-3-amino- propyl-trimethoxysilane (AEAPTMS) nano patterns as linkers for anchoring gold nanoparticles on the surface of SiO2. In this study, conditions of DPN for organic patterns, AEAPTMS, with sub-100 nm dimensions are investigated. Moreover, gold nanoparticles with citrate-negativey-charged surface were deposited selectively on top of DPN orgainc patterns. Lateral force microscope (LFM) was utilized to differentiate different surface between oxidized semi-conductor surfaces and patterned areas with monolayer of AEAPTMS. Line-width as small as 60 nm has been successfully achieved by this method.
AB - Dip-pen nanolithography (DPN), which uses an "inked" AFM tip to deposit organic molecules through a water meniscus onto an underlying substrate under ambient conditions, has been used to create N-(2-aminoethyl)-3-amino- propyl-trimethoxysilane (AEAPTMS) nano patterns as linkers for anchoring gold nanoparticles on the surface of SiO2. In this study, conditions of DPN for organic patterns, AEAPTMS, with sub-100 nm dimensions are investigated. Moreover, gold nanoparticles with citrate-negativey-charged surface were deposited selectively on top of DPN orgainc patterns. Lateral force microscope (LFM) was utilized to differentiate different surface between oxidized semi-conductor surfaces and patterned areas with monolayer of AEAPTMS. Line-width as small as 60 nm has been successfully achieved by this method.
KW - AFM tip
KW - Dip-pen nanolithography (DPN)
KW - Lateral force microscopy (LFM)
KW - N-(2-aminoethyl)-3-amino propyl-tri-meth-oxysilane (AEAPT-MS)
UR - http://www.scopus.com/inward/record.url?scp=33746911181&partnerID=8YFLogxK
U2 - 10.1109/NANO.2005.1500862
DO - 10.1109/NANO.2005.1500862
M3 - Conference contribution
AN - SCOPUS:33746911181
SN - 0780391993
SN - 9780780391994
T3 - 2005 5th IEEE Conference on Nanotechnology
SP - 895
EP - 898
BT - 2005 5th IEEE Conference on Nanotechnology
T2 - 2005 5th IEEE Conference on Nanotechnology
Y2 - 11 July 2005 through 15 July 2005
ER -