Positive bias and temperature stress induced two-stage drain current degradation in HfSiON nMOSFET's

C. T. Chan*, C. J. Tang, Ta-Hui Wang, H. C.H. Wang, D. D. Tang

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

4 Scopus citations

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