Polarized optical scattering measurements of metallic nanoparticles upon a silicon wafer

Cheng Yang Liu*, Wei En Fu

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Bidirectional ellipsometry has been developed as a technique for distinguishing among various scattering features near surfaces. The out-of-plane polarized light-scattering by metallic nanoparticles on wafer is calculated and measured. These calculations and measurements yield angular dependence of bidirectional ellipsometric parameters for out-ofplane scattering. The experimental data show good agreement with theoretical predictions for different diameter of gold spheres. The results suggest that improvements for accuracy are possible to perform measurements of scattering features from metallic nanoparticles. The polarization of light scattered by metallic nanoparticles can be used to determine the size of nano-particulate contaminants on silicon wafers.

Original languageEnglish
Title of host publicationOptical Measurement Systems for Industrial Inspection VI
DOIs
StatePublished - 2009
EventOptical Measurement Systems for Industrial Inspection VI - Munich, Germany
Duration: 15 Jun 200918 Jun 2009

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume7389
ISSN (Print)0277-786X

Conference

ConferenceOptical Measurement Systems for Industrial Inspection VI
Country/TerritoryGermany
CityMunich
Period15/06/0918/06/09

Keywords

  • Bidirectional ellipsometry
  • Light-scattering measurement
  • Metallic nanoparticle

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