Polarized optical scattering measurements of metallic nanoparticles on a thin film silicon wafer

Cheng Yang Liu*, Tze An Liu, Wei En Fu

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Light scattering has shown its powerful diagnostic capability to characterize optical quality surfaces. In this study, the theory of bidirectional reflectance distribution function (BRDF) was used to analyze the metallic nanoparticles' sizes on wafer surfaces. The BRDF of a surface is defined as the angular distribution of radiance scattered by the surface normalized by the irradiance incident on the surface. A goniometric optical scatter instrument has been developed to perform the BRDF measurements on polarized light scattering on wafer surfaces for the diameter and distribution measurements of metallic nanoparticles. The designed optical scatter instrument is capable of distinguishing various types of optical scattering characteristics, which are corresponding to the diameters of the metallic nanoparticles, near surfaces by using the Mueller matrix calculation. The metallic nanoparticle diameter of measurement is 60 nm on 2 inch thin film wafers. These measurement results demonstrate that the polarization of light scattered by metallic particles can be used to determine the size of metallic nanoparticles on silicon wafers.

Original languageEnglish
Title of host publicationFrontiers of Characterization and Metrology for Nanoelectronics - 2009 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics
Pages203-206
Number of pages4
DOIs
StatePublished - 2009
Event2009 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics - Albany, NY, United States
Duration: 11 May 200915 May 2009

Publication series

NameAIP Conference Proceedings
Volume1173
ISSN (Print)0094-243X
ISSN (Electronic)1551-7616

Conference

Conference2009 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics
Country/TerritoryUnited States
CityAlbany, NY
Period11/05/0915/05/09

Keywords

  • Goniometer
  • Light-scattering measurement
  • Metallic nanoparticle
  • Thin film

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