Polarity dependent breakdown of the high- κsi Ox gate stack: A phenomenological explanation by scanning tunneling microscopy

D. S. Ang, Y. C. Ong, S. J. O'Shea, K. L. Pey, C. H. Tung, T. Kawanago, K. Kakushima, H. Iwai

Research output: Contribution to journalArticlepeer-review

5 Scopus citations

Fingerprint

Dive into the research topics of 'Polarity dependent breakdown of the high- κsi O<sub>x</sub> gate stack: A phenomenological explanation by scanning tunneling microscopy'. Together they form a unique fingerprint.

Physics & Astronomy