Plasma-induced charging damage in ultrathin (3 nm) nitrided oxides
- C. C. Chen*
- , Horng-Chih Lin
- , C. Y. Chang
- , M. S. Liang
- , Chao-Hsin Chien
- , S. K. Hsien
- , T. Y. Huang
*Corresponding author for this work
Research output: Contribution to conference › Paper › peer-review
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