Plasma immersion ion implantation for SOI synthesis: SIMOX and ion-cut

Xiang Lu*, S. Sundar Kumar Iyer, Jin Lee, Brian Doyle, Zhineng Fan, Paul K. Chu, Chen-Ming Hu, Nathan W. Cheung

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

13 Scopus citations


We have demonstrated feasibility to form silicon-on-insulator (SOI) substrates using plasma immersion ion implantation (PIII) for both separation by implantation of oxygen and ion-cut. This high throughput technique can substantially lower the high cost of SOI substrates due to the simpler implanter design as well as ease of maintenance. For separation by plasma implantation of oxygen wafers, secondary ion mass spectrometry analysis and cross-sectional transmission electron micrographs show continuous buried oxide formation under a single-crystal silicon over layer with sharp Si/SiO2 interfaces after oxygen plasma implantation and high-temperature (1300°C) annealing. Ion-cut SOI wafer fabrication technique is implemented for the first time using PIII. The hydrogen plasma can be optimized so that only one ion species is dominant in concentration and there are minimal effects by other residual ions on the ion-cut process. The physical mechanism of hydrogen induced silicon surface layer cleavage has been investigated. An ideal gas law model of the microcavity internal pressure combined with a two-dimensional finite element fracture mechanics model is used to approximate the fracture driving force which is sufficient to overcome the silicon fracture resistance.

Original languageEnglish
Pages (from-to)1059-1066
Number of pages8
JournalJournal of Electronic Materials
Issue number9
StatePublished - 1 Jan 1998


  • Fracture mechanics
  • Hydrogen plasma
  • Plasma immersion ion implantation (PIII)
  • Separation by implantation of oxygen (SIMOX)
  • Silicon on insulator (SOI)


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