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Plasma charging induced gate oxide damage during metal etching and ashing
Horng-Chih Lin*, C. H. Perng, Chao-Hsin Chien, S. G. Chiou, T. F. Chang, T. Y. Huang, C. Y. Chang
*Corresponding author for this work
Research output: Contribution to conference › Paper › peer-review
1
Scopus
citations