Plasma Charging Damage During Over-etch Time of Aluminum

Hyungcheol Shin*, Geunsook Park, Chen-Ming Hu

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

There has been a question as to when the oxide damage occurs during plasma etching process. In this paper, we performed experiments to investigate when the plasma etch damage is done to the oxide. Plasma induced oxide charging occurs mainly during the over-etch time. There is no measurable additional damage during the moment of plasma turn-on and off.

Original languageEnglish
Pages (from-to)911-913
Number of pages3
JournalSolid-State Electronics
Volume42
Issue number6
DOIs
StatePublished - 1 Jan 1998

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