Photo-response elimination of amorphous InGaZnO thin film transistors by introducing a Mo-doped-ZnO passivation layer

Yun Chu Tsai*, Min Yen Tsai, Li Feng Teng, Po-Tsun Liu, Han Ping D. Shieh

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

A Mo-doped ZnO (MZO) with a bandgap ~3.3eV is adopted to eliminate the wavelength-dependent photo-responses in a-IGZO TFTs. The MZO passivated a-IGZO TFTs presents AV(h less than 1V under NBIS while the wavelength varied from 360 nm to 620 nm, whereas the unpassivated a-IGZO TFTs exhibits AVth around -10V.

Original languageEnglish
Title of host publication20th International Display Workshops 2013, IDW 2013
PublisherInternational Display Workshops
ChapterAMD3-4
Pages294-296
Number of pages3
ISBN (Electronic)9781510827783
StatePublished - 1 Jan 2013
Event20th International Display Workshops 2013, IDW 2013 - Sapporo, Japan
Duration: 3 Dec 20136 Dec 2013

Publication series

NameProceedings of the International Display Workshops
Volume1
ISSN (Print)1883-2490

Conference

Conference20th International Display Workshops 2013, IDW 2013
Country/TerritoryJapan
CitySapporo
Period3/12/136/12/13

Keywords

  • A-IGZO
  • Nbis
  • Passivation
  • Thin film transistors

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