Performance improvements of tungsten and zinc doped indium oxide thin film transistor by fluorine based double plasma treatment with a high-K gate dielectric

Dun Bao Ruan, Po-Tsun Liu*, Yu Chuan Chiu, Min Chin Yu, Kai Jhih Gan, Ta Chun Chien, Yi Heng Chen, Po Yi Kuo, Simon M. Sze

*Corresponding author for this work

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