Performance improvement for high mobility amorphous indium-zinc-tin-oxide thin-film transistors

Chur Shyang Fuh, Po-Tsun Liu*, Yang Shun Fan, Chih Hsiang Chang, Che Chia Chang

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

2 Scopus citations

Abstract

In this work, the relation between post annealing temperature and electrical characteristic on high mobility a-IZTO TFTs was investigated. The 400°C-annealed a-IZTO TFTs exhibited a better performance with field effect mobility of 39.6 cm2/Vs, Vth of -2.8 V and sub-threshold swing of 0.25 V/decade. Both shallow trap states of a-IZTO film and interface trap states at the a-IZTO/SiO2 interface decreased to 2.16 × 1017 cm-3eV-1 and 4.38 × 1012 cm-2eV-1, respectively with 400°C annealing. Owing to the higher energy from annealing process, the structural relaxation can be enhanced leading a better electrical characteristic of a-IZTO TFTs.

Original languageEnglish
Pages (from-to)1017-1020
Number of pages4
JournalDigest of Technical Papers - SID International Symposium
Volume45
Issue number1
DOIs
StatePublished - Jun 2014

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