Performance and Reliability Evaluation of High Dielectric LDD Spacer on Deep Sub-Micrometer LDD MOSFET

Keyphrases

• High-k Dielectric 100%
• MOSFET 100%
• Reliability Evaluation 100%
• Performance Evaluation 100%
• Deep Submicron 100%
• Transconductance 50%
• Reliability Issues 50%
• AC Performance 50%
• N Dose 50%
• Performance Improvement 33%
• Hot Carrier Reliability 16%
• Two Dimensional 16%
• Sidewall 16%
• Cut-off Frequency 16%
• Fringe Field 16%
• Doping Profile 16%
• Process Reliability 16%
• Total Gate Capacitance 16%
• Diffusion Profile 16%
• Reliability Improvement 16%
• Bottom Oxide 16%
• DC Performance 16%
• Polyoxides 16%
• N Sources 16%
• Process Simulator 16%
• Overlap Capacitance 16%
• Lateral Diffusion 16%

Engineering

• Dielectrics 100%
• Metal-Oxide-Semiconductor Field-Effect Transistor 100%
• Reliability Evaluation 100%
• Reliability Issue 50%
• Performance Improvement 33%
• Side Wall 16%
• Cutoff Frequency 16%
• Two Dimensional 16%
• Gate Capacitance 16%
• Reliability Improvement 16%

Material Science

• Metal-Oxide-Semiconductor Field-Effect Transistor 100%
• Dielectric Material 100%
• Capacitance 33%
• Hot Carrier 16%
• Oxide Compound 16%